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Contents
Objectives
Status of Effort and Major Accomplishments
MURI Supported Publications -
August 1997 - July 1998
Books (Stanford)
Book Chapters (Stanford)
Book Chapters (BU/Princeton/Yale)
Published/Accepted Journal Papers (Stanford)
Published/Accepted Journal Papers (BU/Princeton/Yale)
Submitted Journal Papers (Stanford)
Submitted Journal Papers (BU/Yale/Princeton)
Published/Accepted Conference Papers (Stanford)
Published/Accepted Conference Papers (BU/Princeton/Yale)
Submitted Conference Papers (Stanford)
Interactions/Transitions
Interactions (Stanford)
Transitions (Stanford)
Integrated Bake/Chill Module
Piezoelectric Drop-on-Demand Fluid Ejector
Transitions (BU/Yale/Princeton)
Illuminator Optimization Software
Fast Aerial Image Software
New Discoveries, Inventions or Patent Disclosures
Patents Awarded (Stanford)
Submitted Patents (Stanford)
Invention Disclosures (Stanford)
Honors/Awards
Honors/Awards in 97/98
Major Honors - Prof. T. Kailath
Detailed Overview of Projects
Photoresist Process Monitoring Sensors
Introduction
Technical Description of the Sensor
Photoresist Pre-Exposure Bake Monitoring Update
Postbake Measurement Results
Development Monitoring
Future Work
Conclusions
Overlay and Alignment
Goal
Background
High accuracy positioning based on subspace decomposition of alignment signals
Design and implementation of experiments for verification of the subspace-based alignment technique
Application of subspace-based technique to global alignment
Industrial Interaction
Thermal Cycling Module for Photoresist Processing
Introduction
Experimental Results
Approximations for Partially Coherent Optical Imaging
Introduction
About the Hopkins model
Two existing approximation methods
Average Coherence Approximation (ACA)
Optimal Coherent Decomposition (OCD)
A new approach to the decomposition problem
Solution approaches
Comments on the choice of an error measure
Simulation results
Comparisons and conclusions
Control Issues
Iterative Feedback Tuning
Robust Model Predictive Control
Bake and Chill of Silicon Wafers
Photoresist Cure Monitoring
Control of Drop-Ejector
Blind Channel Deconvolution
CVD Process Simulation
Single Mixed-Potential Integral Equation for Mask Diffraction Simulation
Net-Faim: Distributed Computation of Aerial Images
Illuminator Optimization
Imaging
Contrast
Optimization
Photoresist Deposition without Spinning by Using Inkjet Technology and Micromachined Two Dimensional Array Fluid Ejectors
Large Scale Device
Micromachining
Gokhan PERCIN
Tue Sep 1 11:46:26 PDT 1998